The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
May. 31, 2011
Joeri Lof, Eindhoven, NL;
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Aleksey Kolesnychenko, Nijmegen, NL;
Erik Roelof Loopstra, Heeze, NL;
Theodorus Marinus Modderman, Nuenen, NL;
Johannes Catharinus Hubertus Mulkens, Maastricht, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor DE Smit, Eindhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
Joeri Lof, Eindhoven, NL;
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Aleksey Kolesnychenko, Nijmegen, NL;
Erik Roelof Loopstra, Heeze, NL;
Theodorus Marinus Modderman, Nuenen, NL;
Johannes Catharinus Hubertus Mulkens, Maastricht, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor De Smit, Eindhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a lithographic apparatus, a liquid supply system to provide a liquid to a space between the table and an optical element and to contact a surface of the optical element, the space having a cross-sectional area smaller than the area of the substrate, the liquid supply system comprising a liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, wherein at least part of the liquid confinement structure is positioned between the optical element surface and the table, the at least part of the liquid confinement structure has an aperture through which the patterned beam can pass, the liquid confinement structure comprises an inlet to supply the liquid to the space above the aperture, and the liquid confinement structure comprises an outlet to remove the liquid, supplied by the inlet, from the space below the aperture.