The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2014
Filed:
Jun. 08, 2012
Cyprian Emeka Uzoh, San Jose, CA (US);
Charles G. Woychik, San Jose, CA (US);
Terrence Caskey, San Jose, CA (US);
Kishor V. Desai, Fremont, CA (US);
Huailiang Wei, Allen, TX (US);
Craig Mitchell, San Jose, CA (US);
Belgacem Haba, Saratoga, CA (US);
Cyprian Emeka Uzoh, San Jose, CA (US);
Charles G. Woychik, San Jose, CA (US);
Terrence Caskey, San Jose, CA (US);
Kishor V. Desai, Fremont, CA (US);
Huailiang Wei, Allen, TX (US);
Craig Mitchell, San Jose, CA (US);
Belgacem Haba, Saratoga, CA (US);
Invensas Corporation, San Jose, CA (US);
Abstract
A component can include a substrate and a conductive via extending within an opening in the substrate. The substrate can have first and second opposing surfaces. The opening can extend from the first surface towards the second surface and can have an inner wall extending away from the first surface. A dielectric material can be exposed at the inner wall. The conductive via can define a relief channel within the opening adjacent the first surface. The relief channel can have an edge within a first distance from the inner wall in a direction of a plane parallel to and within five microns below the first surface, the first distance being the lesser of one micron and five percent of a maximum width of the opening in the plane. The edge can extend along the inner wall to span at least five percent of a circumference of the inner wall.