The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2014

Filed:

Apr. 04, 2012
Applicants:

Shih-chieh Chang, Taipei, TW;

Jian-shin Tsai, Tainan, TW;

Chih-chang Huang, Chiayi, TW;

Ing-ju Lee, Tainan, TW;

Chi-cheng Hung, Tainan, TW;

Jun-nan Nian, Tainan, TW;

Chih-chung Chang, Tainan, TW;

Inventors:

Shih-Chieh Chang, Taipei, TW;

Jian-Shin Tsai, Tainan, TW;

Chih-Chang Huang, Chiayi, TW;

Ing-Ju Lee, Tainan, TW;

Chi-Cheng Hung, Tainan, TW;

Jun-Nan Nian, Tainan, TW;

Chih-Chung Chang, Tainan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/02 (2006.01); H01L 27/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for reducing cross-talk in complementary metal oxide semiconductor back side illuminated image sensors is provided. An embodiment comprises forming a grid around the pixel regions on an opposite side of the substrate than metallization layers. The grid may be formed of a material such as tungsten with a (110)-rich crystalline orientation. This orientation helps prevents defects that can occur during patterning of the grid.


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