The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Jan. 06, 2012
Jyuh-fuh Lin, Chunan Township, Miaoli County, TW;
Te-chih Huang, Chu-Bei, TW;
Guo-tsai Huang, Hsinchu County, TW;
Jia-rui HU, Taichung, TW;
Chih-ming KE, Hsinchu, TW;
Jyuh-Fuh Lin, Chunan Township, Miaoli County, TW;
Te-Chih Huang, Chu-Bei, TW;
Guo-Tsai Huang, Hsinchu County, TW;
Jia-Rui Hu, Taichung, TW;
Chih-Ming Ke, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
In one embodiment, a method for detecting design defects is provided. The method includes receiving design data of an integrated circuit (IC) on a wafer, measuring wafer topography across the wafer to obtain topography data, calculating a scanner moving average from the topography data and the design data to provide a scanner defocus map across the wafer, and determining a hotspot design defect from the scanner defocus map. A computer readable storage medium, and a system for detecting design defects are also provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile