The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Dec. 28, 2009
Ying-chou Cheng, Zhubei, TW;
Tsong-hua Ou, Taipei, TW;
Josh J. H. Feng, Lotung, TW;
Cheng-lung Tsai, Hsin-Chu, TW;
Ru-gun Liu, Hsinchu, TW;
Wen-chun Huang, Xi-Gang Xiang, TW;
Ying-Chou Cheng, Zhubei, TW;
Tsong-Hua Ou, Taipei, TW;
Josh J. H. Feng, Lotung, TW;
Cheng-Lung Tsai, Hsin-Chu, TW;
Ru-Gun Liu, Hsinchu, TW;
Wen-Chun Huang, Xi-Gang Xiang, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure provides an integrated circuit design method in many different embodiments. An exemplary IC design method comprises providing an IC design layout of a circuit in a first technology node; migrating the IC design layout of the circuit to a second technology node; applying an electrical patterning (ePatterning) modification to the migrated IC design layout according to an electrical parameter of the circuit; and thereafter fabricating a mask according to the migrated IC design layout of the circuit in the second technology node.