The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Dec. 01, 2011
Applicants:
Cheng-te Lin, Taipei, TW;
Chih-lin Wang, Zhubei, TW;
Yi-huang Wu, Zhubei, TW;
Tzong-sheng Chang, Chubei, TW;
Inventors:
Cheng-Te Lin, Taipei, TW;
Chih-Lin Wang, Zhubei, TW;
Yi-Huang Wu, Zhubei, TW;
Tzong-Sheng Chang, Chubei, TW;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/331 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods are disclosed of forming and removing a reacted layer on a surface of a recess to provide mechanisms for improving thickness uniformity of a semiconductor material formed in the recess. The improved thickness uniformity in turn improves the uniformity of device performance.