The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Dec. 16, 2011
Nobutaka Mizutani, Nirasaki, JP;
Tsutae Omori, Nirasaki, JP;
Takehiko Orii, Nirasaki, JP;
Akira Fujita, Albany, NY (US);
Nobutaka Mizutani, Nirasaki, JP;
Tsutae Omori, Nirasaki, JP;
Takehiko Orii, Nirasaki, JP;
Akira Fujita, Albany, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
Disclosed are a liquid processing method, a liquid processing apparatus, and a recording medium that can prevent convex portions of a target substrate from collapsing when a rinsing liquid is dried. A base surface of a target substrate is hydrophilized and the surfaces of convex portions become water-repellent by surface-processing the target substrate which includes a main body, a plurality of convex portions protruding from the main body, and a base surface formed between the convex portions on the substrate main body. Next, a rinsing liquid is supplied to the target substrate which has been subjected to the surface processing. Thereafter, the rinsing liquid is removed from the target substrate.