The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2014

Filed:

Apr. 25, 2012
Applicants:

Mei-chun Lin, Taichung, TW;

Ching-fang Yu, Hsinchu, TW;

Ting-hao Hsu, Hsinchu, TW;

Sheng-chi Chin, Hsinchu, TW;

Inventors:

Mei-Chun Lin, Taichung, TW;

Ching-Fang Yu, Hsinchu, TW;

Ting-Hao Hsu, Hsinchu, TW;

Sheng-Chi Chin, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of identifying defects including producing, with an imaging system, an original image of a fabricated article having a feature thereon, the feature having an intended height and extracting a contour image from the original image, the contour image having an outline of those portions of the feature having a height approximate to the intended height. The method also includes producing a simulated image of the article based upon the contour and creating a defect image based on the differences between the simulated image and the original image, the defect image including any portions of the feature having a height less than the intended height.


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