The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Dec. 10, 2009
Masahiro Watanabe, Yokohama, JP;
Toshihiko Nakata, Hiratsuka, JP;
Yasuhiro Yoshitake, Yokohama, JP;
Hideaki Sasazawa, Yokohama, JP;
Minoru Yoshida, Yokohama, JP;
Masahiro Watanabe, Yokohama, JP;
Toshihiko Nakata, Hiratsuka, JP;
Yasuhiro Yoshitake, Yokohama, JP;
Hideaki Sasazawa, Yokohama, JP;
Minoru Yoshida, Yokohama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical headhaving a fine repetitive pattern; a θ driving unitof scanning an inspected substraterelatively to the near-field optical head; a space holding mechanism of holding a space between the near-field optical headand the inspected substrateconstant; alight sourceof irradiating light to the near-field optical head; a detection systemof detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical headand a fine pattern on a surface of the inspected substrate; and a signal processing unitof inspecting the fine pattern on the inspected substratebased on an output of the detection system