The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Sep. 27, 2010
Applicants:
Johannes Henricus Wilhelmus Jacobs, Heeze, NL;
Nicolaas Ten Kate, Almkerk, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Gerrit Van Donk, Vollenhove, NL;
Johannes Van ES, Zwolle, NL;
Inventors:
Johannes Henricus Wilhelmus Jacobs, Heeze, NL;
Nicolaas Ten Kate, Almkerk, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Gerrit Van Donk, Vollenhove, NL;
Johannes Van Es, Zwolle, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03B 27/52 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.