The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Nov. 17, 2011
James W. Thackeray, Braintree, MA (US);
Emad Aqad, Northborough, MA (US);
Su Jin Kang, Grafton, MA (US);
Owendi Ongayi, Marlborough, MA (US);
James W. Thackeray, Braintree, MA (US);
Emad Aqad, Northborough, MA (US);
Su Jin Kang, Grafton, MA (US);
Owendi Ongayi, Marlborough, MA (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
A copolymer has formula: wherein R-Rare independently H, Calkyl, or Caryl, Ris a fluorinated or non-fluorinated Cacid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic Caryl group; each Rand Ris —ORor —C(CF)ORwhere each Ris H, a fluorinated or non-fluorinated Cacid decomposable group, or a combination; each Ris independently F, a Calkyl, Cfluoroalkyl, Calkoxy, or a Cfluoroalkoxy group; Ris a cation-bound Cphotoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.