The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Jun. 28, 2013
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Ping-Chieh Wu, New Taipei, TW;
Chien-Hsun Chen, Hsinchu, TW;
Ru-Gun Liu, Zhubei, TW;
Wen-Chun Huang, Tainan, TW;
Chih-Ming Lai, Hsinchu, TW;
Boren Luo, Zhubei, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure is directed generally to a method and apparatus for monitoring mask process impact on lithography performance. A method including receiving a physical wafer pattern according to a mask, extracting a mask contour from the mask, and extracting a deconvolution pattern based on the mask contour. A lithography process is simulated to create a virtual wafer pattern based on the deconvolution pattern. The virtual wafer pattern is then compared to the physical wafer pattern.