The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Oct. 12, 2010
Satoshi Tomimatsu, Hitachinaka, JP;
Tsuyoshi Onishi, Hitachinaka, JP;
Toshihide Agemura, Tsuchiura, JP;
Terutaka Nanri, Hitachinaka, JP;
Satoshi Tomimatsu, Hitachinaka, JP;
Tsuyoshi Onishi, Hitachinaka, JP;
Toshihide Agemura, Tsuchiura, JP;
Terutaka Nanri, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A charged particle beam apparatus of the present invention comprises a transmission electron detector () having a detection portion divided into multiple regions (toto), wherein a film thickness of a sample is calculated by detecting a transmission electron beam () generated from the sample when the sample is irradiated with an electron beam (), as a signal of each of the regions in accordance with scattering angles of the transmission electron beam, and thereafter calculating the intensities of the individual signals. According to the above, there is provided a charged particle beam apparatus capable of performing accurate film thickness monitoring while suppressing an error due to an external condition and also capable of processing a thin film sample into a sample having an accurate film thickness, which makes it possible to improve the accuracy in structure observations, element analyses and the like.