The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
May. 02, 2012
Shih-chi Wang, Taipei, TW;
Jeng-horng Chen, Hsin-Chu, TW;
Shih-Chi Wang, Taipei, TW;
Jeng-Horng Chen, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure describes an apparatus of leveling a substrate in a charged particle lithography system. In an example, the apparatus includes a cantilever-based sensor that includes an optical sensor and a cantilever structure. The optical sensor determines a distance between the optical sensor and a surface of the substrate based on light reflected from the cantilever structure. In an example, a first distance is between the cantilever structure and optical sensor, a second distance is a height of the cantilever structure, and a third distance is between the optical sensor and the surface of the substrate. The optical sensor determines the first distance based on the light reflected from the cantilever structure, such that the third distance is determined from the first distance and the second distance.