The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Jul. 01, 2011
David Keith Carlson, San Jose, CA (US);
Satheesh Kuppurao, San Jose, CA (US);
Howard Beckford, San Jose, CA (US);
Herman Diniz, Fremont, CA (US);
Kailash Kiran Patalay, Santa Clara, CA (US);
Brian Hayes Burrows, San Jose, CA (US);
Jeffrey Ronald Campbell, San Francisco, CA (US);
Zouming Zhu, Santa Clara, CA (US);
Xiaowei LI, Austin, TX (US);
Errol Antonio Sanchez, Tracy, CA (US);
David Keith Carlson, San Jose, CA (US);
Satheesh Kuppurao, San Jose, CA (US);
Howard Beckford, San Jose, CA (US);
Herman Diniz, Fremont, CA (US);
Kailash Kiran Patalay, Santa Clara, CA (US);
Brian Hayes Burrows, San Jose, CA (US);
Jeffrey Ronald Campbell, San Francisco, CA (US);
Zouming Zhu, Santa Clara, CA (US);
Xiaowei Li, Austin, TX (US);
Errol Antonio Sanchez, Tracy, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.