The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Oct. 23, 2009
Niyaz Khusnatdinov, Round Rock, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Mario Johannes Meissl, Austin, TX (US);
Michael N. Miller, Austin, TX (US);
Ecron D. Thompson, Round Rock, TX (US);
Gerard M. Schmid, Austin, TX (US);
Pawan Kumar Nimmakayala, Austin, TX (US);
Xiaoming LU, Cedar Park, TX (US);
Byung-jin Choi, Austin, TX (US);
Niyaz Khusnatdinov, Round Rock, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Mario Johannes Meissl, Austin, TX (US);
Michael N. Miller, Austin, TX (US);
Ecron D. Thompson, Round Rock, TX (US);
Gerard M. Schmid, Austin, TX (US);
Pawan Kumar Nimmakayala, Austin, TX (US);
Xiaoming Lu, Cedar Park, TX (US);
Byung-Jin Choi, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.