The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Dec. 01, 2011
Makoto Kaneko, Yokkaichi, JP;
Takayoshi Fujii, Yokohama, JP;
Yusaku Konno, Yokohama, JP;
Mitsutoshi Watabiki, Yokkaichi, JP;
Yusuke Ilda, Yokkaichi, JP;
Shinichi Imai, Tokyo, JP;
Yuichiro Yamazaki, Tokyo, JP;
Makoto Kaneko, Yokkaichi, JP;
Takayoshi Fujii, Yokohama, JP;
Yusaku Konno, Yokohama, JP;
Mitsutoshi Watabiki, Yokkaichi, JP;
Yusuke Ilda, Yokkaichi, JP;
Shinichi Imai, Tokyo, JP;
Yuichiro Yamazaki, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
In accordance with an embodiment, a pattern inspection method includes: applying a light generated from a light source to the same region of a substrate in which an inspection target pattern is formed; guiding, imaging and then detecting a reflected light from the substrate, and acquiring a detection signal for each of a plurality of different wavelengths; and adding the detection signals of the different wavelengths in association with an incident position of an imaging surface to generate added image data including information on a wavelength and signal intensity, judging, by the added image data, whether the inspection target pattern has any defect, and when judging that the inspection target pattern has a defect, detecting the position of the defect in a direction perpendicular to the substrate.