The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Sep. 15, 2011
Wye Boon Loh, Singapore, SG;
Jeoung MO Koo, Singapore, SG;
Paul Kim Cheong Soh, Singapore, SG;
Beng Lye OH, Singapore, SG;
Purakh Raj Verma, Casablanca, SG;
Wye Boon Loh, Singapore, SG;
Jeoung Mo Koo, Singapore, SG;
Paul Kim Cheong Soh, Singapore, SG;
Beng Lye Oh, Singapore, SG;
Purakh Raj Verma, Casablanca, SG;
Globalfoundries Singapore Pte. Ltd., Singapore, unknown;
Abstract
There is provided a method comprising receiving data corresponding to a layout design for a plurality of input mask layers and generating a layout design for at least one generated mask layer. The relationship between a first geometric element in a first layout pattern comprising one or more of the generated mask layers and a second geometric element in a second layout pattern is then determined and verified to check if they comply with predetermined rules. If the relationship does not conform with the predetermined rules the design of at least one of the generated mask layers associated with the first or second layout pattern is modified.