The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Oct. 09, 2012
Applicants:
Akira Hamamatsu, Yokohama, JP;
Shunji Maeda, Yokohama, JP;
Hisae Shibuya, Chigasaki, JP;
Inventors:
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01); G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated.