The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Nov. 29, 2010
Edward Crandal Cooney, Iii, Jericho, VT (US);
Peter James Lindgren, Essex Junction, VT (US);
Doreen Jane Ossenkop, North Hudson, NY (US);
Anthony Kendall Stamper, Williston, VT (US);
Edward Crandal Cooney, III, Jericho, VT (US);
Peter James Lindgren, Essex Junction, VT (US);
Doreen Jane Ossenkop, North Hudson, NY (US);
Anthony Kendall Stamper, Williston, VT (US);
Ultratech, Inc., San Jose, CA (US);
Abstract
A microelectronic structure, such as a semiconductor structure, and a method for fabricating the microelectronic structure, include an aperture within a substrate. Into the aperture is located and formed a via. The via may include a through substrate via. The aperture includes, progressing sequentially contiguously at least partially through the substrate: (1) a first comparatively wide region at a surface of the substrate; (2) a constricted region contiguous with the first comparatively wide region; (3) a second comparatively wide region contiguous with the constricted region; and (4) a tapered region contiguous with the second comparatively wide region. The structure of the aperture provides for ease in filling the aperture, as well as void isolation within the via that is filled into the aperture.