The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8604430 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 10, 2013

Filed:

Feb. 06, 2012
Applicants:

Yuko Iwabuchi, Mito, JP;

Hideo Todokoro, Nishitama-gun, JP;

Hiroyoshi Mori, Hitachinaka, JP;

Mitsugu Sato, Hitachinaka, JP;

Yasutsugu Usami, Toshina-ku, JP;

Mikio Ichihashi, Kodaira, JP;

Satoru Fukuhara, Hitachinaka, JP;

Hiroyuki Shinada, Chofu, JP;

Yutaka Kaneko, Hachiouji, JP;

Katsuya Sugiyama, Kashiwa, JP;

Atsuko Takafuji, Nerima-ku, JP;

Hiroshi Toyama, Hachiouji, JP;

Inventors:

Yuko Iwabuchi, Mito, JP;

Hideo Todokoro, Nishitama-gun, JP;

Hiroyoshi Mori, Hitachinaka, JP;

Mitsugu Sato, Hitachinaka, JP;

Yasutsugu Usami, Toshina-ku, JP;

Mikio Ichihashi, Kodaira, JP;

Satoru Fukuhara, Hitachinaka, JP;

Hiroyuki Shinada, Chofu, JP;

Yutaka Kaneko, Hachiouji, JP;

Katsuya Sugiyama, Kashiwa, JP;

Atsuko Takafuji, Nerima-ku, JP;

Hiroshi Toyama, Hachiouji, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01);
Abstract

The inspection apparatus disclosed generates an electron beam, an acceleration electrode accelerates the electron beam, a convergence lens converges the electron beam, an electron beam deflector scans the beam over a sample, an objective lens converges the electron beam on the sample, a detector located between the sample and the objective lens detects charged particles emitted from the sample, a power supply applies a retarding voltage to the sample for decelerating the electron beam to the sample, an electrode is disposed between the objective lens and the sample, and a voltage is generated between the sample and the electrode by said electrode, the voltage being determined depending on the sample. The apparatus solves problems encountered in conventional inspection systems.


Find Patent Forward Citations

Iwabuchi, Yuko. (2013). Method and an apparatus of an inspection system using an electron beam (U.S. Patent No. 8604430). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8604430

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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