The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Dec. 31, 2009
Chin-hsiang Lin, Hsinchu, TW;
Heng-jen Lee, Hsinchu County, TW;
I-hsiung Huang, Hukou Shiang, TW;
Chih-chiang Tu, Tauyen, TW;
Chun-jen Chen, Renwu Township, Kaohsiung County, TW;
Rick Lai, Taichung, TW;
Chin-Hsiang Lin, Hsinchu, TW;
Heng-Jen Lee, Hsinchu County, TW;
I-Hsiung Huang, Hukou Shiang, TW;
Chih-Chiang Tu, Tauyen, TW;
Chun-Jen Chen, Renwu Township, Kaohsiung County, TW;
Rick Lai, Taichung, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure provides for many different embodiments. An exemplary method can include providing a blank mask and a design layout to be patterned on the blank mask, the design layout including a critical area; inspecting the blank mask for defects and generating a defect distribution map associated with the blank mask; mapping the defect distribution map to the design layout; performing a mask making process; and performing a mask defect repair process based on the mapping.