The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2013
Filed:
Jun. 18, 2010
Jiro Higashijima, Kumamoto, JP;
Hiromitsu Namba, Kumamoto, JP;
Jiro Higashijima, Kumamoto, JP;
Hiromitsu Namba, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
There is provided a liquid processing apparatus capable of preventing an atmospheric air of a lower surface side of a substrate, to which a processing liquid is supplied, from circulating and being introduced into an upper surface side of the substrate, to which the processing liquid is not supplied, and capable of decreasing a fuzzy gas consumption supplied to separate the atmospheres between the lower and upper surface sides from each other. An upper plateis disposed at an opposite side to the upper surface of the substrate maintained horizontally and a gas suppliersupplies a pressurized gas into a space formed between the upper plate and the substrate. Also, due to a negative pressure built in a space formed between the upper plate and the substrate, an atmospheric gas outside the space is introduced into the space via a gas inlet port.