The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Oct. 06, 2011
Applicants:
Timothy W. Weidman, Sunnyvale, CA (US);
Timothy Michaelson, Milpitas, CA (US);
Paul Deaton, San Jose, CA (US);
Inventors:
Timothy W. Weidman, Sunnyvale, CA (US);
Timothy Michaelson, Milpitas, CA (US);
Paul Deaton, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods for forming photoresists sensitive to radiation on substrate are provided. Atomic layer deposition methods of forming films (e.g., silicon-containing films) photoresists are described. The process can be repeated multiple times to deposit a plurality of silicon photoresist layers. Process of depositing photoresist and forming patterns in photoresist are also disclosed which utilize carbon containing underlayers such as amorphous carbon layers.
Published as:
US2012088369A1; US2012088193A1; WO2012048094A2; WO2012048108A2; TW201224190A; TW201224191A; WO2012048108A3; WO2012048094A3; US8465903B2; CN103189962A; US8536068B2; KR20140009169A;