The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2013
Filed:
Jan. 20, 2012
Hiroyasu Shichi, Tokyo, JP;
Shinichi Matsubara, Komae, JP;
Takashi Ohshima, Saitama, JP;
Satoshi Tomimatsu, Hitachinaka, JP;
Tomihiro Hashizume, Hatoyama, JP;
Tohru Ishitani, Hitachinaka, JP;
Hiroyasu Shichi, Tokyo, JP;
Shinichi Matsubara, Komae, JP;
Takashi Ohshima, Saitama, JP;
Satoshi Tomimatsu, Hitachinaka, JP;
Tomihiro Hashizume, Hatoyama, JP;
Tohru Ishitani, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.