The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2013

Filed:

Dec. 31, 2009
Applicants:

Lee Wee Teo, Singapore, SG;

Chunshan Yin, Singapore, SG;

Shyue Seng Tan, Singapore, SG;

Chung Foong Tan, Singapore, SG;

Jae Gon Lee, Singapore, SG;

Elgin Quek, Singapore, SG;

Purakh Raj Verma, Singapore, SG;

Inventors:

Lee Wee Teo, Singapore, SG;

Chunshan Yin, Singapore, SG;

Shyue Seng Tan, Singapore, SG;

Chung Foong Tan, Singapore, SG;

Jae Gon Lee, Singapore, SG;

Elgin Quek, Singapore, SG;

Purakh Raj Verma, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 29/788 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for forming a device is presented. A substrate prepared with a feature having first and second adjacent surfaces is provided. A device layer is formed on the first and second adjacent surfaces of the feature. A first portion of the device layer over the first adjacent surface includes nano-crystals, whereas a second portion of the device layer over the second adjacent surface is devoid of nano-crystals.


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