The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2013
Filed:
Nov. 10, 2010
Tzung-han Tan, Taipei, TW;
Bang-chiang Lan, Taipei, TW;
Ming-i Wang, Taipei County, TW;
Chien-hsin Huang, Taichung, TW;
Meng-jia Lin, Changhua County, TW;
Tzung-Han Tan, Taipei, TW;
Bang-Chiang Lan, Taipei, TW;
Ming-I Wang, Taipei County, TW;
Chien-Hsin Huang, Taichung, TW;
Meng-Jia Lin, Changhua County, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A microelectromechanical system (MEMS) device and a method for fabricating the same are described. The MEMS device includes a first electrode and a second electrode. The first electrode is disposed on a substrate, and includes at least two metal layers, a first protection ring and a dielectric layer. The first protection ring connects two adjacent metal layers, so as to define an enclosed space between two adjacent metal layers. The dielectric layer is disposed in the enclosed space and connects two adjacent metal layers. The second electrode is disposed on the first electrode, wherein a cavity is formed between the first electrode and the second electrode.