The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Jun. 01, 2007
Frederik Eduard DE Jong, Eindhoven, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Marinus Aart Van Den Brink, Moergestel, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Leon Martin Levasier, Hedel, NL;
Frits Van Der Meulen, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Richard Bernardus Johannes Droste, Weebosch-Bergeijk, NL;
Johannes Wilhelmus DE Klerk, Knegsel, NL;
Peter Franciscus Wanten, Mierlo, NL;
Jan Cornelis Van Der Hoeven, Veldhoven, NL;
Edwin Cornelis Kadijk, Eindhoven, NL;
Marteijn DE Jong, Wintelre, NL;
David Lucien Anstotz, Westhoffen, FR;
Frederik Eduard De Jong, Eindhoven, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Marinus Aart Van Den Brink, Moergestel, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Leon Martin Levasier, Hedel, NL;
Frits Van Der Meulen, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Richard Bernardus Johannes Droste, Weebosch-Bergeijk, NL;
Johannes Wilhelmus De Klerk, Knegsel, NL;
Peter Franciscus Wanten, Mierlo, NL;
Jan Cornelis Van Der Hoeven, Veldhoven, NL;
Edwin Cornelis Kadijk, Eindhoven, NL;
Marteijn De Jong, Wintelre, NL;
David Lucien Anstotz, Westhoffen, FR;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.