The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Dec. 13, 2010
Eric Eva, Aalen, DE;
Payam Tayebati, Ulm, DE;
Michael Thier, Moegglingen, DE;
Markus Hauf, Ulm, DE;
Ulrich Schoenhoff, Ulm, DE;
Ole Fluegge, Bartholomae, DE;
Arif Kazi, Aalen, DE;
Alexander Sauerhoefer, Hamburg, DE;
Gerhard Focht, Wilmsdorf, DE;
Jochen Weber, Heidenheim-Grosskuchen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Eric Eva, Aalen, DE;
Payam Tayebati, Ulm, DE;
Michael Thier, Moegglingen, DE;
Markus Hauf, Ulm, DE;
Ulrich Schoenhoff, Ulm, DE;
Ole Fluegge, Bartholomae, DE;
Arif Kazi, Aalen, DE;
Alexander Sauerhoefer, Hamburg, DE;
Gerhard Focht, Wilmsdorf, DE;
Jochen Weber, Heidenheim-Grosskuchen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.