The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Jul. 21, 2010
Pong-wey Huang, Tainan, TW;
Hsi-hua Liu, Taipei, TW;
Chia-jen Wang, Pingtung County, TW;
Shuen-cheng Lei, Taipei County, TW;
Huai-te Huang, Kaohsiung County, TW;
Jen-po Huang, Tainan County, TW;
Pong-Wey Huang, Tainan, TW;
Hsi-Hua Liu, Taipei, TW;
Chia-Jen Wang, Pingtung County, TW;
Shuen-Cheng Lei, Taipei County, TW;
Huai-Te Huang, Kaohsiung County, TW;
Jen-Po Huang, Tainan County, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method for optimizing an inspection recipe of a defect inspection tool is described. A substrate having thereon intentional defects and locating patterns beside the intentional defects is provided. The defect inspection tool is used to detect the intentional defects with an inspection recipe and obtain the distribution of undetected or partially detected intentional defects. The locating patterns are utilized to locate the undetected or partially detected intentional defects and thereby determine the type(s) of the undetected or partially detected intentional defects. The inspection recipe is modified according to the type(s) of the undetected or partially detected intentional defects in a manner such that there is a minimal number of undetected or partially detected intentional defects under the inspection of the defect inspection tool.