The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Oct. 08, 2010
Che-hua Hsu, Hsinchu County, TW;
Shao-hua Hsu, Taoyuan County, TW;
Zhi-cheng Lee, Tainan, TW;
Cheng-guo Chen, Changhua County, TW;
Che-Hua Hsu, Hsinchu County, TW;
Shao-Hua Hsu, Taoyuan County, TW;
Zhi-Cheng Lee, Tainan, TW;
Cheng-Guo Chen, Changhua County, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method of selectively removing a patterned hard mask is described. A substrate with a patterned target layer thereon is provided, wherein the patterned target layer includes a first target pattern and at least one second target pattern, and the patterned hard mask includes a first mask pattern on the first target pattern and a second mask pattern on the at least one second target pattern. A first photoresist layer is formed covering the first mask pattern. The sidewall of the at least one second target pattern is covered by a second photoresist layer. The second mask pattern is removed using the first photoresist layer and the second photoresist layer as a mask.