The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Jun. 23, 2011
Svetlana Radovanov, Marblehead, MA (US);
Jason Schaller, Austin, TX (US);
Richard White, Newmarket, NH (US);
Kevin Verrier, Newmarket, NH (US);
James Blanchette, Haverhill, MA (US);
Bon-woong Koo, Andover, MA (US);
Eric Hermanson, Georgetown, MA (US);
Kevin Daniels, Lynnfield, MA (US);
Svetlana Radovanov, Marblehead, MA (US);
Jason Schaller, Austin, TX (US);
Richard White, Newmarket, NH (US);
Kevin Verrier, Newmarket, NH (US);
James Blanchette, Haverhill, MA (US);
Bon-Woong Koo, Andover, MA (US);
Eric Hermanson, Georgetown, MA (US);
Kevin Daniels, Lynnfield, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
A system and method are disclosed for controlling an ion beam. A deceleration lens is disclosed for use in an ion implanter. The lens may include a suppression electrode, first and second focus electrodes, and first and second shields. The shields may be positioned between upper and lower portions of the suppression electrode. The first and second shields are positioned between the first focus electrode and an end station of the ion implanter. Thus positioned, the first and second shields protect support surfaces of said first and second focus electrodes from deposition of back-streaming particles generated from said ion beam. In some embodiments, the first and second focus electrodes may be adjustable to enable the electrode surfaces to be adjusted with respect to a direction of the ion beam. By adjusting the angle of the focus electrodes, parallelism of the ion beam can be controlled. Other embodiments are described and claimed.