The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Jan. 13, 2010
Kaori Shirahata, Mitaka, JP;
Yoshinori Nakayama, Sayama, JP;
Keiichiro Hitomi, Delmar, NY (US);
Muneyuki Fukuda, Kokubunji, JP;
Yasunari Sohda, Kawasaki, JP;
Kaori Shirahata, Mitaka, JP;
Yoshinori Nakayama, Sayama, JP;
Keiichiro Hitomi, Delmar, NY (US);
Muneyuki Fukuda, Kokubunji, JP;
Yasunari Sohda, Kawasaki, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In order to provide a charged beam device capable of obtaining a precise image of a sample surface pattern while improving the accuracy of automatic focus/astigmatism correction, there are provided an electron gun (), a deflection control portion () which allows an electron beam to scan, a focus control portion () and an astigmatism correction portion () for the electron beam, an image processing portion (), and a switching portion () which switches scan conditions when obtaining pattern information of the sample () surface and scan conditions when performing the automatic focus/astigmatism correction, and a scan speed and scan procedures are switched between when obtaining the pattern information and when performing the automatic focus/astigmatism correction.