The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2013
Filed:
Jul. 27, 2009
Noritsugu Takahashi, Kokubunji, JP;
Muneyuki Fukuda, Kokubunji, JP;
Tomoyasu Shojo, Saitama, JP;
Naomasa Suzuki, Hitachinaka, JP;
Kenji Obara, Kawasaki, JP;
Noritsugu Takahashi, Kokubunji, JP;
Muneyuki Fukuda, Kokubunji, JP;
Tomoyasu Shojo, Saitama, JP;
Naomasa Suzuki, Hitachinaka, JP;
Kenji Obara, Kawasaki, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A system is provided that realizes both reduction in coordinate error and improvement in throughput and allows observation of a micro-defect. The system includes: a function of measuring an amount of displacement between preliminarily calculated coordinates and an actual specimen position; a function of optimizing a coordinate correction formula so as to minimize the amount of displacement from the measured amount of displacement; and a function of calculating variation of displacement between the preliminarily calculated coordinates and the actual specimen position by statistical processing. When a value of coordinate variation is sufficiently small with respect to the field of view of an image for observation, which is to be a defect observation image, the system acquires only the image for observation without performing acquisition of an image for search, which is to be a defect search image.