The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2013

Filed:

Oct. 22, 2007
Applicants:

Jason Arjavac, Hillsboro, OR (US);

Pei Zou, Shanghai, CN;

David James Tasker, Portland, OR (US);

Maximus Theodorus Otten, Best, NL;

Gerhard Daniel, Portland, OR (US);

Inventors:

Jason Arjavac, Hillsboro, OR (US);

Pei Zou, Shanghai, CN;

David James Tasker, Portland, OR (US);

Maximus Theodorus Otten, Best, NL;

Gerhard Daniel, Portland, OR (US);

Assignee:

FEI Company, Hillsboro, OR (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/06 (2006.01); G01N 1/08 (2006.01); G01N 23/04 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. Preferred embodiments of the present invention also provide an in-line process for S/TEM based metrology on objects such as integrated circuits or other structures fabricated on semiconductor wafer by providing methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis.


Find Patent Forward Citations

Loading…