The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2013
Filed:
Mar. 18, 2011
Sander Frederik Wuister, Eindhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Yvonne Wendela Kruijt-stegeman, Eindhoven, NL;
Tatyana Viktorovna Rakhimova, Moscow, RU;
Dmitriy Viktorovich Lopaev, Kololev, RU;
Denis Alexandrovich Glushkov, Alfter, DE;
Andrei Mikhailovich Yakunin, Eindhoven, NL;
Roelof Koole, Eindhoven, NL;
Sander Frederik Wuister, Eindhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Yvonne Wendela Kruijt-Stegeman, Eindhoven, NL;
Tatyana Viktorovna Rakhimova, Moscow, RU;
Dmitriy Viktorovich Lopaev, Kololev, RU;
Denis Alexandrovich Glushkov, Alfter, DE;
Andrei Mikhailovich Yakunin, Eindhoven, NL;
Roelof Koole, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.