The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
Dec. 15, 2009
Tatsuya Yanagida, Hiratsuka, JP;
Akira Endo, Hiratsuka, JP;
Hiroshi Komori, Hiratsuka, JP;
Shinji Nagai, Hiratsuka, JP;
Kouji Kakizaki, Hiratsuka, JP;
Tamotsu Abe, Hiratsuka, JP;
Hideo Hoshino, Hiratsuka, JP;
Tatsuya Yanagida, Hiratsuka, JP;
Akira Endo, Hiratsuka, JP;
Hiroshi Komori, Hiratsuka, JP;
Shinji Nagai, Hiratsuka, JP;
Kouji Kakizaki, Hiratsuka, JP;
Tamotsu Abe, Hiratsuka, JP;
Hideo Hoshino, Hiratsuka, JP;
Gigaphoton Inc., Tochigi, JP;
Abstract
In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.