The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
Mar. 28, 2012
Anil K. Chinthakindi, Poughkeepsie, NY (US);
Douglas D. Coolbaugh, Essex Junction, VT (US);
Keith E. Downes, Stowe, VT (US);
Ebenezer E. Eshun, Essex Junction, VT (US);
Zhong-xiang He, Essex Junction, VT (US);
Robert M. Rassel, Colchester, VT (US);
Anthony K. Stamper, Williston, VT (US);
Anil K. Chinthakindi, Poughkeepsie, NY (US);
Douglas D. Coolbaugh, Essex Junction, VT (US);
Keith E. Downes, Stowe, VT (US);
Ebenezer E. Eshun, Essex Junction, VT (US);
Zhong-Xiang He, Essex Junction, VT (US);
Robert M. Rassel, Colchester, VT (US);
Anthony K. Stamper, Williston, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of fabricating a MIM capacitor is provided. The method includes providing a substrate including a dielectric layer formed on a first conductive layer and a second conductive layer formed over the dielectric layer, and patterning a mask on the second conductive layer. Exposed portions of the second conductive layer are removed to form an upper plate of a MIM capacitor having edges substantially aligned with respective edges of the mask. The upper plate is undercut so that edges of the upper plate are located under the mask. Exposed portions of the dielectric layer and the first conductive layer are removed using the mask to form a capacitor dielectric layer and a lower plate of the MIM capacitor having edges substantially aligned with respective edges of the mask.