The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2013

Filed:

Jun. 09, 2008
Applicants:

Alexandra Pazidis, Aalen, DE;

Christoph Zaczek, Heubach, DE;

Alexander Hirnet, Oberkochen, DE;

Herbert Fink, Mannheim, DE;

Dieter Schmerek, Huettlingen, DE;

Inventors:

Alexandra Pazidis, Aalen, DE;

Christoph Zaczek, Heubach, DE;

Alexander Hirnet, Oberkochen, DE;

Herbert Fink, Mannheim, DE;

Dieter Schmerek, Huettlingen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of processing an optical element which has a substrate () and a layer system () applied to the substrate (), wherein the layer system () in a starting condition has a plurality of volume defects (), wherein the method includes at least partially filling at least one of the volume defects () with a filling material (). Also disclosed is an associated method of manufacturing an optical element.


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