The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2013
Filed:
Feb. 20, 2009
Applicants:
Yukihiro Shibata, Fujisawa, JP;
Yasuhiro Yoshitake, Yokohama, JP;
Inventors:
Yukihiro Shibata, Fujisawa, JP;
Yasuhiro Yoshitake, Yokohama, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H04N 7/18 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a defect inspection apparatus for inspecting a wafer provided with a circuit pattern for defects, the illuminating direction of illuminating light rays is selectively determined such that an area containing a defect that scatters light of high intensity coincides with the aperture of a dark-field detecting system, and such that regularly reflected light regularly reflected by a pattern, which is noise to defect detection, does not coincide with the aperture of the dark field detecting system.