The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Jun. 09, 2009
Vadim Yevgenyevich Banine, Deurne, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Wouter Anthon Soer, Nijmwegen, NL;
Martin Jacobus Johan Jak, Eindhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Wouter Anthon Soer, Nijmwegen, NL;
Martin Jacobus Johan Jak, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H, D, and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.