The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2013
Filed:
Sep. 17, 2010
Damian Fiolka, Oberkochen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Alexandra Pazidis, Essingen-Lautenburg, DE;
Michael Ricker, Aalen, DE;
Damian Fiolka, Oberkochen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Alexandra Pazidis, Essingen-Lautenburg, DE;
Michael Ricker, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.