The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Feb. 07, 2007
Jiro Hiraiwa, Osaka, JP;
Osamu Yoshimoto, Osaka, JP;
Hiroshi Hayakawa, Osaka, JP;
Tetsuro Tojo, Osaka, JP;
Tsuneyuki Okabe, Nirasaki, JP;
Takanobu Asano, Oshu, JP;
Shinichi Wada, Nirasaki, JP;
Ken Nakao, Nirasaki, JP;
Hitoshi Kato, Nirasaki, JP;
Jiro Hiraiwa, Osaka, JP;
Osamu Yoshimoto, Osaka, JP;
Hiroshi Hayakawa, Osaka, JP;
Tetsuro Tojo, Osaka, JP;
Tsuneyuki Okabe, Nirasaki, JP;
Takanobu Asano, Oshu, JP;
Shinichi Wada, Nirasaki, JP;
Ken Nakao, Nirasaki, JP;
Hitoshi Kato, Nirasaki, JP;
Toyo Tanso Co., Ltd., Osaka-shi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Fluorine gas generators are connected with semiconductor manufacturing apparatuses through a gas supplying system including a storage tank that can store a predetermined quantity of fluorine gas generated in the on-site fluorine gas generators. When one or more of the on-site fluorine gas generators are stopped, fluorine gas is supplied to the semiconductor manufacturing apparatuses from the storage tank storing a predetermined quantity of fluorine gas, so as to keep the operations of the semiconductor manufacturing apparatuses. Thereby obtained is a semiconductor manufacturing plant in which fluorine gas generated in the fluorine gas generators can be safely and stably supplied to the semiconductor manufacturing apparatuses, and with superior cost performance.