The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2013
Filed:
Jun. 13, 2007
Masahiro Okesaku, Komatsu, JP;
Tetsuya Goto, Sendai, JP;
Tadahiro Ohmi, Sendai, JP;
Kiyotaka Ishibashi, Minato-ku, JP;
Masahiro Okesaku, Komatsu, JP;
Tetsuya Goto, Sendai, JP;
Tadahiro Ohmi, Sendai, JP;
Kiyotaka Ishibashi, Minato-ku, JP;
Tokyo Electron Ltd., Tokyo, JP;
National University Corporation Tohoku University, Miyagi, JP;
Abstract
Occurrence of a back-flow of plasma or ignition of gas for plasma excitation in a longitudinal hole portion can be prevented more completely, and a shower plate in which efficient plasma excitation is possible is provided. In shower plate, which is arranged in processing chamberof a plasma processing apparatus and discharges gas for plasma excitation into processing chamber, porous-gas passing bodyhaving a pore that communicates in the gas flow direction is fixed onto longitudinal holeused as a discharging path of gas for plasma excitation. The pore diameter of a narrow path in a gas flowing path formed of a pore, which communicates to porous-gas passing body, is 10 μm or lower.