The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Jul. 08, 2010
Erik Roelof Loopstra, Eindhoven, NL;
Vladimir Vitalevich Ivanov, Moscow, RU;
Johannes Hubertus Josephina Moors, Helmond, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Andrei Mikhailovich Yakunin, Eindhoven, NL;
Dennis DE Graaf, Waalre, NL;
Uwe Bruno Heini Stamm, Goettingen, DE;
Erik Roelof Loopstra, Eindhoven, NL;
Vladimir Vitalevich Ivanov, Moscow, RU;
Johannes Hubertus Josephina Moors, Helmond, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Andrei Mikhailovich Yakunin, Eindhoven, NL;
Dennis De Graaf, Waalre, NL;
Uwe Bruno Heini Stamm, Goettingen, DE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.