The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2013
Filed:
Mar. 29, 2006
Yoshiaki Sasaski, Nirasaki, JP;
Yusuke Muraki, Nirasaki, JP;
Eiichi Nishimura, Nirasaki, JP;
Yuko Ono, Nirasaki, JP;
Yoshiaki Sasaski, Nirasaki, JP;
Yusuke Muraki, Nirasaki, JP;
Eiichi Nishimura, Nirasaki, JP;
Yuko Ono, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In a substrate processing apparatus comprising a processing unit where a specific type of processing is executed on a wafer and a transfer chamber through which a wafer is carried into/out of the processing unit, the transfer chamber includes an air intake unit through which external air is drawn into the transfer chamber, a discharge unit disposed so as to face opposite the air intake unit, through which the discharge gas in the transfer chamber is discharged and a discharge gas filtering means disposed at the discharge unit and constituted with a harmful constituent eliminating filter through which a harmful constituent contained in the discharge gas, at least, is eliminated.