The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8343308 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 01, 2013

Filed:

Aug. 20, 2008
Applicants:

Caizhong Tian, Amagasaki, JP;

Tetsuya Nishizuka, Amagasaki, JP;

Kiyotaka Ishibashi, Amagasaki, JP;

Toshihisa Nozawa, Amagasaki, JP;

Inventors:

Caizhong Tian, Amagasaki, JP;

Tetsuya Nishizuka, Amagasaki, JP;

Kiyotaka Ishibashi, Amagasaki, JP;

Toshihisa Nozawa, Amagasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract

A ceiling plate provided at a ceiling portion of a process chamber that may be evacuated to a vacuum is disclosed. The ceiling plate allows microwaves emitted from a slot of a planar antenna member provided along with the ceiling plate to pass through the ceiling plate into the process chamber, and includes plural concave portions provided along a circle on a surface of the ceiling plate, the surface facing toward an inside of the process chamber.


Find Patent Forward Citations

Tian, Caizhong. (2013). Ceiling plate and plasma process apparatus (U.S. Patent No. 8343308). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8343308

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