The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2012
Filed:
Apr. 28, 2010
Ruud Antonius Catharina Maria Beerens, Roggel, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Fransiscus Mathijs Jacobs, Asten, NL;
Ruud Antonius Catharina Maria Beerens, Roggel, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Fransiscus Mathijs Jacobs, Asten, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.