The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2012
Filed:
Oct. 22, 2009
Tadashi Otaka, Hitachinaka, JP;
Hiroyuki Ito, Hitachinaka, JP;
Ryoichi Ishii, Hitachinaka, JP;
Manabu Yano, Hitachiohmiya, JP;
Hajime Kawano, Hitachinaka, JP;
Tadashi Otaka, Hitachinaka, JP;
Hiroyuki Ito, Hitachinaka, JP;
Ryoichi Ishii, Hitachinaka, JP;
Manabu Yano, Hitachiohmiya, JP;
Hajime Kawano, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An exemplary a charged particle beam apparatus converts an inspection position on a test sample (wafer coordinate system) to a setting position of an inspection mechanism (stage coordinate system (polar coordinate system)), a rotating arm and a rotating stage being rotated to be moved for the inspection position on the test sample. In this case, inspection devices are arranged over a locus that is drawn by the center of the rotating stage according to the rotation of the rotating arm. A function for calculating errors (e.g., center shift of the rotating stage) and compensating for the errors is provided, by which the precision of inspection is improved in a charged particle beam apparatus equipped with a biaxial rotating stage mechanism.