The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
Jun. 24, 2008
Applicants:
Shyue Seng Tan, Singapore, SG;
Lee Wee Teo, Singapore, SG;
Yung Fu Chong, Singapore, SG;
Elgin Quek, Singapore, SG;
Sanford Chu, Singapore, SG;
Inventors:
Shyue Seng Tan, Singapore, SG;
Lee Wee Teo, Singapore, SG;
Yung Fu Chong, Singapore, SG;
Elgin Quek, Singapore, SG;
Sanford Chu, Singapore, SG;
Assignee:
GLOBALFOUNDRIES Singapore Pte. Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a device is presented. The method includes providing a structure having first and second regions. A diffusion barrier is formed between at least a portion of the first and second regions. The diffusion barrier comprises cavities that reduce diffusion of elements between the first and second regions.